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[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - An analytical model for beam induced contamination in ion implantation

✍ Scribed by Ryssel, H.; Frey, L.; Haublein, V.; Lucassen, M.; Gyulai, J.

Book ID: 125540273
Publisher: IEEE
Year: 1998
Weight: 380 KB
Volume: 1
Category: Article
ISBN-13: 9780780345386
DOI: 10.1109/IIT.1999.812161

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