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[IEEE 1992 Symposium on VLSI Technology Digest of Technical Papers - Seattle, WA, USA (2-4 June 1992)] 1992 Symposium on VLSI Technology Digest of Technical Papers - A native-oxide-free process for 4 nm capacitor dielectrics

✍ Scribed by Nakano, M.; Shinmura, N.; Iguchi, K.; Watanabe, T.; Sakiyama, K.

Book ID: 126745992
Publisher: IEEE
Year: 1992
Weight: 175 KB
Category: Article
ISBN-13: 9780780306981
DOI: 10.1109/VLSIT.1992.200621

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