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[IEEE 1991 Eighth International IEEE VLSI Multilevel Interconnection Conference - Santa Clara, CA, USA (11-12 June 1991)] 1991 Proceedings Eighth International IEEE VLSI Multilevel Interconnection Conference - Sputtered TiN performance as an anti-reflective coating in backend sub-um i-line lithography process

✍ Scribed by Chen, S.; Chen, C.L.; Tsou, S.

No coin nor oath required. For personal study only.

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[IEEE 1991 Eighth International IEEE VLS

✍ Takata, Y.; Ishii, A.; Matsuura, M.; Ohsaki, A.; Iwasaki, M.; Miyazaki, J.; Fuji 📂 Article 📅 1991 🏛 IEEE ⚖ 484 KB