Monomolecular layer epitaxy of GaAs for
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Jun-ichi Nishizawa; Toru Kurabayashi
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Article
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1997
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John Wiley and Sons
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English
⚖ 276 KB
An ideal static induction transistor (ISIT) structure was fabricated using molecular layer epitaxy (MLE). The doping method of MLE enabled us to achieve a sufficiently high level of doping for ISIT fabrication. In the fabrication process a low growth temperature was very important for the device str