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Hydrogenated amorphous silicon deposited by pulsed DC magnetron sputtering. Deposition temperature effect

✍ Scribed by A. Ben Abdelmoumen; R. Cherfi; M. Kechoune; M. Aoucher

Book ID: 108290210
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 293 KB
Volume: 517
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2008.08.133

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