Hydrogen-plasma etching of hydrogenated amorphous silicon: a study by a combination of spectroscopic ellipsometry and trap-limited diffusion model

✍ Scribed by Kaïl, F.; Fontcuberta I Morral, A.; Hadjadj, A.; Roca I Cabarrocas, P.; Beorchia, A.

• Book ID: 120461538
• Publisher: Taylor and Francis Group
• Year: 2004
• Tongue: English
• Weight: 256 KB
• Volume: 84
• Category: Article
• ISSN: 1478-6435
• DOI: 10.1080/14786430310001635440