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Hydrogen dilution effect on microstructure of Si thin film grown by catalyzer enhanced chemical vapor deposition

✍ Scribed by Han-Ki Kim

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
926 KB
Volume
253
Category
Article
ISSN
0168-583X

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We report on the effects of deposition pressure P d on the growth and properties of the B-doped nanocrystalline silicon (nc-Si:H) thin films grown by hot-wire chemical vapor deposition (HWCVD) at very high hydrogen dilution of 98.8%. We found that the crystallinity of nc-Si:H or mc-Si:H films is not