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How surface roughness affects the angular dependence of the sputtering yield

✍ Scribed by A. Hu; A. Hassanein


Book ID
113823885
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
953 KB
Volume
281
Category
Article
ISSN
0168-583X

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The effect of microrelief evolution on t
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The dynamically steady-state surface relief of polycrystalline copper sputtered by high-dose (10 18 -10 19 ion/cm 2 ) 30 keV Ar + ion bombardment at room temperature has been traced as a function of the ion incidence angle h i in a wide (0-80Β°) angular range. For each incidence angle the distributio