How boron incorporation during Si1−xGexchemical vapor deposition degrades the Ge profile

✍ Scribed by H. Kühne; A. Fischer; T. Morgenstern; D. Grützmacher

• Book ID: 106245148
• Publisher: Springer
• Year: 1998
• Tongue: English
• Weight: 340 KB
• Volume: 2
• Category: Article
• ISSN: 1432-8488
• DOI: 10.1007/s100080050100