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Highly reliable SiO/sub 2//Si/sub 3/N/sub 4/ stacked dielectric on rapid-thermal-nitrided rugged polysilicon for high-density DRAM's

✍ Scribed by G. Lo; S. Ito; D. Kwong; V. Mathews; P. Fazan

Book ID: 126716267
Publisher: IEEE
Year: 1992
Tongue: English
Weight: 309 KB
Volume: 13
Category: Article
ISSN: 0741-3106
DOI: 10.1109/55.192759

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