✦ LIBER ✦

High temperature stability of CrSi(W)N films

✍ Scribed by W. Brückner; H. Grieβmann; J.-I. Mönch; G. Schubert; A. Heinrich

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 475 KB
Volume: 221
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(92)90807-n

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Degradation of CrSi(W)O resistive films

✍ W. Brückner; H. Grieβmann; H. Schreiber; H. Vinzelberg; A. Heinrich 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 888 KB

Electrical properties of heterogeneous C

Electrical properties of heterogeneous CrSi(O,N) thin films

✍ A Heinrich; C Gladun; H Schreiber; J Schumann; H Vinzelberg 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 259 KB

Standard enthalpy of formation of CrSi2

Standard enthalpy of formation of CrSi2 by high-temperature mixing calorimetry

✍ Letitia Topor; O.J Kleppa 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 446 KB

Resistance, temperature coefficient of r

Resistance, temperature coefficient of resistance and long-term stability of annealed thin NiCrSi films

✍ W. Gawalek 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 353 KB

High-temperature stability of Au Pt/n-Ga

High-temperature stability of Au Pt/n-GaAs Schottky barrier diodes

✍ Shyam P. Murarka 📂 Article 📅 1974 🏛 Elsevier Science 🌐 English ⚖ 766 KB

Evolution of crystal structure of Zn:N f

Evolution of crystal structure of Zn:N films under high temperature

✍ C. Chityuttakan; K. Wantong; S. Chatraphorn; K. Yoodee 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 149 KB

## Abstract Zinc‐nitrogen (Zn:N) compound thin film was prepared from a pure metallic Zn target by rf magnetron sputtering at ambient temperature under the mixture of nitrogen and argon gases with the ratio of 1:1. High temperature x‐ray diffraction (HTXRD) measurement under vacuum was used to exam