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High temperature resistance studies of thin nickel foils exposed to hydrogen and oxygen

✍ Scribed by B.A. Quimby; S.R. Shatynski


Book ID
103906625
Publisher
Elsevier Science
Year
1982
Weight
509 KB
Volume
7
Category
Article
ISSN
0390-6035

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✦ Synopsis


Resistance measurements were performed on thin mckel foils exposed to argon-oxygen gas mixtures at elevated temperatures. The resistance initially mcreased very rapidly then at oxygen pressures less than 0.08 atm, the resistance change decreased substantially before slowly increasing. At higher oxygen pressures no decrease in the resistance change occurred. These results are interpreted in hght of hydrogen-oxygen-mckel interactions which occur as a result of hydrogen dissolution in nickel prior to oxidation. The hydrogen originates from long-term hydrogen anneals prior to the oxidation.


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An apparatus for measuring internal fric
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We have designed and built an apparatus for measuring internal friction Q-1 (t) and electrical resistance of thin films and foils, of thickness 1 to 200 ~2, in the temperature range from 4.2 to 300 K.