High-temperature oxidation-protection CV
✍
J Desmaison; N Roels; P Belair
📂
Article
📅
1989
🏛
Elsevier Science
🌐
English
⚖ 688 KB
## Chemical vapour deposition of Si3N 4 by pyrolysis (1200-1275°C) of tetramethylsilane-ammonia-hydrogen mixtures (N:Si = 10) was used to protect reaction-bonded silicon nitride substrates against internal oxidation at 1000-1350 °C. The results reveal the existence of a critical thickness (6 gm)