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High-temperature oxidation-protection CVD coatings for structural ceramics: Oxidation behaviour of CVD-coated reaction-bonded silicon nitride

✍ Scribed by J Desmaison; N Roels; P Belair


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
688 KB
Volume
120-121
Category
Article
ISSN
0921-5093

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✦ Synopsis


Chemical vapour deposition of Si3N 4 by

pyrolysis (1200-1275°C) of tetramethylsilane-ammonia-hydrogen mixtures (N:Si = 10) was used to protect reaction-bonded silicon nitride substrates against internal oxidation at 1000-1350 °C. The results reveal the existence of a critical thickness (6 gm) of the coatings and the poorer protectiveness of amorphous deposited coatings compared with crystallized coatings. Under the optimum deposition conditions, better protection was achieved than by the use of more conventional surface modification treatments such as high-temperature flash pre-oxidation.