High temperature deformation of silicon nitride ceramics with different microstructures
β Scribed by Naoki Kondo; Fumihiro Wakai; Masamichi Yamagiwa; Takao Nishioka; Akira Yamakawa
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 452 KB
- Volume
- 206
- Category
- Article
- ISSN
- 0921-5093
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Highly porous Si 3 N 4 with macroscopically aligned pores were prepared by the unidirectional freeze casting process using liquid N 2 as refrigerant. The increased sintering temperature had no obvious influence on the porosity, but significantly promoted β£ β β€-Si 3 N 4 phase transformation and the g
## Chemical vapour deposition of Si3N 4 by pyrolysis (1200-1275Β°C) of tetramethylsilane-ammonia-hydrogen mixtures (N:Si = 10) was used to protect reaction-bonded silicon nitride substrates against internal oxidation at 1000-1350 Β°C. The results reveal the existence of a critical thickness (6 gm)