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High stability co-sputtered Ta-50 at. % Al alloy film resistors : F. Huber and D. Jaffe. Proc. 21st Electron. Compon. Conf., Washington D.C., U.S.A., 10–12 May (1971), p. 198

Book ID: 103271418
Publisher: Elsevier Science
Year: 1972
Tongue: English
Weight: 224 KB
Volume: 11
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(72)90684-1

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