Effects of process variables on thick-film resistors : D. W. Williams. Proc. 21st Electron. Compon. Conf., Washington D.C., U.S.A., 10–12 May (1971), p. 454

• Publisher: Elsevier Science
• Year: 1972
• Tongue: English
• Weight: 110 KB
• Volume: 11
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(72)90673-7