✦ LIBER ✦

High-sensitivity porous silicon photodetectors fabricated through rapid thermal oxidation and rapid thermal annealing

✍ Scribed by Lee, M.K.; Wang, Y.H.; Chu, C.H.

Book ID: 117868808
Publisher: IEEE
Year: 1997
Tongue: English
Weight: 58 KB
Volume: 33
Category: Article
ISSN: 0018-9197
DOI: 10.1109/3.644102

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Oxidation phase growth diagram of vanadi

Oxidation phase growth diagram of vanadium oxides film fabricated by rapid thermal annealing

✍ Kozo, Tamura ;Li, Zheng-cao ;Wang, Yu-quan ;Ni, Jie ;Hu, Yin ;Zhang, Zheng-jun 📂 Article 📅 2009 🏛 Higher Education Press and Springer 🌐 English ⚖ 377 KB

Etching rate modification in silicon oxi

Etching rate modification in silicon oxide by ion implantation and rapid thermal annealing

✍ C. Domínguez; B. Garrido; J. Montserrat; J.R. Morante; J. Samitier 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 275 KB

Electrical and structural properties of

Electrical and structural properties of rapid thermal annealed RF sputtered silicon oxide films

✍ W.K. Choi; K.K. Han; W.K. Chim 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 299 KB

BF2 ion implantation in silicon through

BF2 ion implantation in silicon through surface oxides, behaviour of the fluorine with rapid thermal annealing

✍ M.C. Ozturk; J.J. Wortman; W.K. Chu; G. Rozgonyi; D.P. Griffis 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 353 KB

Buried Si3N4 layers in silicon produced

Buried Si3N4 layers in silicon produced by high-intensity implantation and rapid thermal annealing

✍ R.V. Gribkovskii; F.F. Komarov; A.P. Novikov 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 201 KB

Size and density control of silicon oxid

Size and density control of silicon oxide nanowires by rapid thermal annealing and their growth mechanism

✍ Yi-Sheng Lai; Jyh-Liang Wang; Sz-Chian Liou; Chia-Hsun Tu 📂 Article 📅 2008 🏛 Springer 🌐 English ⚖ 702 KB