High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn–Ta metal-sintered target

✍ Scribed by Y. Muto; S. Nakatomi; N. Oka; Y. Iwabuchi; H. Kotsubo; Y. Shigesato

• Book ID: 113937348
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 863 KB
• Volume: 520
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2011.10.061