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High rate and process control of reactive sputtering by gas pulsing: the Ti–O system

✍ Scribed by Nicolas Martin; Alain R Bally; Peter Hones; Rosendo Sanjinés; Francis Lévy

Book ID: 114085336
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 364 KB
Volume: 377-378
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(00)01440-1

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