High-Quality Wide-Gap Hydrogenated Amorphous Silicon Fabricated Using Hydrogen Plasma Post-Treatment

✍ Scribed by Okamoto, Shingo; Hishikawa, Yoshihiro; Tsuge, Sadaji; Sasaki, Manabu; Ninomiya, Kunimoto; Nishikuni, Masato; Tsuda, Shinya

• Book ID: 118056942
• Publisher: Institute of Pure and Applied Physics
• Year: 1994
• Tongue: English
• Weight: 923 KB
• Volume: 33
• Category: Article
• ISSN: 0021-4922
• DOI: 10.1143/jjap.33.1773