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High pressure and high temperature in situ X-ray diffraction study on the structural stability of tantalum disilicide

✍ Scribed by Li, C.Y.; Yu, Z.H.; Liu, H.Z.; Lü, T.Q.

Book ID: 122815430
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 642 KB
Volume: 157
Category: Article
ISSN: 0038-1098
DOI: 10.1016/j.ssc.2012.12.020

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