High-pressure and high-temperature annealing as an activation method for ion-implanted dopants in diamond

✍ Scribed by Ueda, K.; Kasu, M.; Makimoto, T.

• Book ID: 111965146
• Publisher: American Institute of Physics
• Year: 2007
• Tongue: English
• Weight: 324 KB
• Volume: 90
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.2715034