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Damage removal and defect control in As ion implanted Si1−xGex epilayers during a high-temperature annealing process

✍ Scribed by L.-F Zou; S.E Acosta-Ortiz; L.E Regalado; LuXin Zou


Book ID
114156037
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
186 KB
Volume
51-52
Category
Article
ISSN
0167-9317

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