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High growth rate process in a SiC horizontal CVD reactor using HCl

✍ Scribed by F. La Via; G. Galvagno; F. Roccaforte; F. Giannazzo; S. Di Franco; A. Ruggiero; R. Reitano; L. Calcagno; G. Foti; M. Mauceri; S. Leone; G. Pistone; F. Portuese; G. Abbondanza; G. Abbagnale; A. Veneroni; F. Omarini; L. Zamolo; M. Masi; G.L. Valente; D. Crippa

Book ID: 104050433
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 133 KB
Volume: 83
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2005.10.023

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