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High giant magnetoresistance in electrodeposited Cu/Co nano-multilayers

✍ Scribed by Gupta, Priyanka ;Pandya, Dinesh K. ;Kashyap, Subhash C. ;Chaudhary, Sujeet


Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
315 KB
Volume
204
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

Nano‐multilayers of Cu(6 nm)/Co(∼22 nm) have been electrodeposited in potentiostatic pulse mode on ITO coated glass substrates. Cyclic voltammetry and chronoamperometric studies were performed to determine the potential and duration for the deposition of individual layers. A 50‐bilayer stack exhibited a room temperature GMR of 12.5%, at 8 kOe. Even at low fields of ∼3 kOe, this multilayer exhibited ∼10% GMR, thereby demonstrating the potential application of electrodeposition (ED) process in achieving appreciable value of GMR at room temperature and at lower field values. The observed high value of GMR at room temperature may be attributed to the antiferromagnetically (AF) aligned magnetic layers in the absence of magnetic field. (Β© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)


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Preparation of Giant Magnetoresistance Co-Cu Heterogeneous Alloys by Electrodeposition. -Heterogenous Co-Cu alloy thin films (β‰ˆ1 Β΅m thick) grown at room temperature on a (111) Pt single-crystal substrate from a sulfate electrolyte containing Co2+ and Cu2+ are characterized by TEM, XRD, and magnetic