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High energy electron induced displacement damage in silicon

✍ Scribed by Dale, C.J.; Marshall, P.W.; Burke, E.A.; Summers, G.P.; Wolicki, E.A.


Book ID
114554581
Publisher
IEEE
Year
1988
Tongue
English
Weight
780 KB
Volume
35
Category
Article
ISSN
0018-9499

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Electron beam induced damage of silicon
✍ D.J. Paul; J.M. Ryan; M. Pepper; A.N. Broers; T.E. Whall; J.M. FernΓ‘ndez; B.A. J πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 304 KB

The damage to modulation-doped pseudomorphic SiGe channels was investigated for a typical 40 keV electron beam lithography resist technique and also a high resolution 300 keV direct write SiO2 patterning technique. Annealing studies on the irradiated samples were also performed. Results show that th