High Density and Low Leakage Current in $ \hbox{TiO}_{2}$ MIM Capacitors Processed at 300 $^{\circ} \hbox{C}$

✍ Scribed by Cheng, C. H.; Lin, S. H.; Jhou, K. Y.; Chen, W. J.; Chou, C. P.; Yeh, F. S.; Hu, J.; Hwang, M.; Arikado, T.; McAlister, S. P.; Chin, Albert

• Book ID: 121851151
• Publisher: IEEE
• Year: 2008
• Tongue: English
• Weight: 276 KB
• Volume: 29
• Category: Article
• ISSN: 0741-3106
• DOI: 10.1109/LED.2008.2000833