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High-coupling and ultra-low-loss interlaced stacked transformers for 60 100-GHz CMOS RFIC applications

✍ Scribed by Yo-Sheng Lin; Chi-Chen Chen; Chang-Zhi Chen; Po-Feng Yeh


Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
236 KB
Volume
49
Category
Article
ISSN
0895-2477

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✦ Synopsis


Abstract

In this article, we demonstrate that high‐coupling and ultra‐low‐loss transformers for 60–100‐GHz CMOS RFIC applications can be achieved by using single‐turn two‐layer interlaced stacked (STIS) structure implemented in a standard CMOS technology. State‐of‐the‐art G~Amax~ of 0.711, 0.922, and ∼1 (i.e., NF~min~ of 1.48, 0.35, and ∼0 dB) were achieved at 60, 80, and 100 GHz, respectively, for a STIS transformer with an inner dimension of 50 × 50 μm^2^ and a metal width of 5 μm, mainly due to the high magnetic‐coupling factor and the high resistive‐coupling factor. In addition, a 94.1% (from 5.61 to 10.89) and a 196.8% (from 8.36 to 24.81) increase in Q‐factor, a 14.2% (from 0.711 to 0.812), and an 8.5% (from 0.922 to ∼1) increase in G~Amax~, and a 0.58 dB (from 1.48 to 0.90 dB) and a 0.35 dB (from 0.35 to ∼0 dB) decrease in NF~min~ were achieved at 60 and 80 GHz, respectively, for the transformer after the post‐process of proton implantation. The present analysis is helpful for RF engineers to design ultra‐low‐voltage high‐performance 60–100‐GHz transformer‐feedback CMOS (or BiCMOS) LNAs and VCOs, and other RF‐ICs which include transformers. © 2007 Wiley Periodicals, Inc. Microwave Opt Technol Lett 49: 1750–1753, 2007; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.22537


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## Abstract In this article, we demonstrate that high‐coupling and ultra‐low‐loss transformers for Ka‐Band (26–40 GHz) CMOS RFIC applications can be achieved by using single‐turn interlaced‐stacked (STIS) structure implemented in a standard 0.18‐μm CMOS technology. State‐of‐the‐art G~A__max__~ of 0