✦ LIBER ✦

High contrast marks for e-beam direct write made by reactive ion etching

✍ Scribed by M.N. Webster; A.H. Verbruggen; H.F.F. Jos; J. Romijn; P.M.A. Moors; S. Radelaar

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 282 KB
Volume: 17
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(92)90011-f

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Ion and electron beam deposited masks fo

Ion and electron beam deposited masks for pattern transfer by reactive ion etching

✍ A. Notargiacomo; E. Giovine; L. Di Gaspare 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 408 KB

We report on the use of a carbon-rich Pt-based material, obtained by electron and ion beam assisted deposition from metal-organic precursor, as a mask for pattern transfer processes. Thin and narrow mask patterns subjected to oxygen plasma and reactive ion etching (RIE) of silicon in SF 6 were inves

Patterning of a Ti/Pt/Au metallization f

Patterning of a Ti/Pt/Au metallization for submicron bipolar transistors made by direct write e-beam lithography

✍ M.N. Webster; A.H. Verbruggen; H.F.F. Jos; J. Romijn; P.M.A. Moors; S. Radelaar 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 417 KB