High aspect ratio, 0.1 μm structures obtained by single layer resist and conventional electron beam lithography

✍ Scribed by M. Gentili; L. Grella; L. Luciani; L. Mastrogiacomo; L. Scopa

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 304 KB
• Volume: 13
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90080-w