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HF contamination of 200 mm Al wafers: A parallel angle resolved XPS study

โœ Scribed by B. Pelissier; H. Fontaine; A. Beaurain; A. Danel; O. Joubert


Book ID
104052772
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
481 KB
Volume
88
Category
Article
ISSN
0167-9317

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Parallel angle resolved XPS investigatio
โœ B. Pelissier; A. Beaurain; J.P. Barnes; R. Gassilloud; F. Martin; O. Joubert ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 420 KB

Parallel angle resolved X-ray photoelectron spectroscopy (ARXPS) was used to study the oxidation of W and WSi x thin films CVD-deposited on 12 in. silicon wafers. The thin films were exposed to air during defined periods of time. Immediately after layer deposition, the wafers were rapidly loaded in