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$hbox{Al}_{2} hbox{O}_{3}$/n-InAs Metal–Oxide–Semiconductor Capacitors With Various Surface Treatments]]>

✍ Scribed by Trinh, H. D.; Brammertz, G.; Chang, E. Y.; Kuo, C. I.; Lu, C. Y.; Lin, Y. C.; Nguyen, H. Q.; Wong, Y. Y.; Tran, B. T.; Tran, K.

Book ID: 127253458
Publisher: IEEE
Year: 2011
Tongue: English
Weight: 379 KB
Volume: 32
Category: Article
ISSN: 0741-3106
DOI: 10.1109/led.2011.2128853

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$hbox{Al}_{2} hbox{O}_{3}$/n-InAs Metal&#x2013;Oxide&#x2013;Semiconductor Capacitors With Various Surface Treatments]]>

$hbox{Al}_{2} hbox{O}_{3}$/n-InAs Metal–Oxide–Semiconductor Capacitors With Various Surface Treatments]]>