𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Hard amorphous carbon–fluorine films deposited by PECVD using C2H2–CF4 gas mixtures as precursor atmospheres

✍ Scribed by Jacobsohn, L.G.; Maia da Costa, M.E.H.; Trava-Airoldi, V.J.; Freire, F.L.

Book ID
121227576
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
100 KB
Volume
12
Category
Article
ISSN
0925-9635

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Crystalline carbon nitride deposition by
Crystalline carbon nitride deposition by r.f.-PECVD using a C2H4-NH3-H2 source gas mixture
✍ Lim, S. F.; Wee, A. T. S.; Lin, J.; Chua, D. H. C. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 432 KB

Carbon nitride films have been deposited on Si(100) substrates by r.f. plasma-enhanced chemical vapour deposition (r.f.-PECVD) using an ethylene-ammonia-hydrogen (C 2 H 4 -NH 3 -H 2 ) source gas mixture followed by rapid thermal annealing (RTA) at 1000 °C for 2 min. The films were characterized in t