Handbook of chemical vapor depostion [i.e. deposition] (CVD) : principles, technology, and applications
โ Scribed by Hugh O Pierson
- Publisher
- Noyes Publications/William Andrew Pub
- Year
- 1999
- Tongue
- English
- Leaves
- 505
- Series
- Materials science and process technology series
- Edition
- 2nd ed
- Category
- Library
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properti
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now es
<p><P><STRONG>Principles of Chemical Vapor Deposition</STRONG> provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of bet
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an inte
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now es