Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications (Materials Science and Process Technology)

✍ Scribed by Arthur Sherman

• Year: 1989
• Tongue: English
• Leaves: 229
• Edition: 1st
• Category: Library

✦ Synopsis

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

✦ Table of Contents

MATERIALS SCIENCE AND PROCESS TECHNOLOGY SERIES......Page 3
CHEMICAL VAPOR DEPOSITIONFOR MICROELECTRONICS......Page 4
Preface......Page 6
Contents......Page 10
1 Fundamentals of Thermal CVD......Page 14
2 Fundamentals of Plasma-Assisted CVD......Page 53
3 Thermal CVD of Dielectrics and Semiconductors......Page 79
4 Thermal CVD of Metallic Conductors......Page 105
5 Plasma-Enhanced CVD......Page 132
6 Production CVD Reactor Systems......Page 163
7 Film Evaluation Techniques......Page 188
Index......Page 226

✦ Subjects

Междисциплинарные материалы;