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Hall mobility in DC-sputtered Bi2Sr2CaCu2O8+δ films as a function of in-situ controlled oxygen content

✍ Scribed by B. Beschoten; U. Rüdiger; J. Auge; C. Quitmann; H. Frank; H. Kurz; G. Güntherodt

No coin nor oath required. For personal study only.

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