𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Hall coefficient in vacuum-deposited copper films

✍ Scribed by A. Kinbara; K. Ueki


Publisher
Elsevier Science
Year
1972
Tongue
English
Weight
169 KB
Volume
12
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Microstructure formation in electrochemi
✍ K. Kremmer; O. Yezerska; G. Schreiber; M. Masimov; V. Klemm; M. Schneider; D. Ra πŸ“‚ Article πŸ“… 2007 πŸ› John Wiley and Sons 🌐 English βš– 187 KB

## Abstract The influence of the electrochemical potential and deposition mode on the preferred orientation, morphology and microstructure of crystallites in electrochemically deposited (ECD) copper thin films was investigated using X‐ray diffraction (XRD), scanning electron microscopy (SEM) and th