Hafnium Oxide and Zirconium Oxide Atomic Layer Deposition: Initial Precursor and Potential Side-Reaction Product Pathways with H/Si(100)-2×1

✍ Scribed by Fenno, Ryan D.; Halls, Mathew D.; Raghavachari, Krishnan

• Book ID: 126851917
• Publisher: American Chemical Society
• Year: 2005
• Tongue: English
• Weight: 107 KB
• Volume: 109
• Category: Article
• ISSN: 0022-3654
• DOI: 10.1021/jp048663g