Growth temperature dependence of the crystalline morphology of SiGe films grown on Si(110) substrates with compositionally step-graded buffer

✍ Scribed by Keisuke Arimoto; Masato Watanabe; Junji Yamanaka; Kiyokazu Nakagawa; Kentarou Sawano; Yasuhiro Shiraki; Noritaka Usami; Kazuo Nakajima

• Book ID: 108290207
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 345 KB
• Volume: 517
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2008.08.130