𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Growth, optical and nanostructural properties of magnetron sputtered ZnO thin films deposited on polymeric substrates

✍ Scribed by Koidis, C. ;Logothetidis, S. ;Georgiou, D. ;Laskarakis, A. ;Lousinian, S. ;Tsiaoussis, I. ;Frangis, N.


Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
481 KB
Volume
205
Category
Article
ISSN
0031-8965

No coin nor oath required. For personal study only.

✦ Synopsis


Abstract

ZnO thin films were deposited onto flexible Poly‐Ethylene Terephthalate and Poly‐Ethylene Naphthalate substrates in an ultra‐high vacuum chamber by Pulsed DC Magnetron Sputtering. The process took place at room temperature and in argon atmosphere with fixed pressure, by applying two different power values on the target, in order to investigate their effect on the growth, optical, nanostructural and topographical properties of the films. In‐situ and real‐time Spectroscopic Ellipsometry in the 1.5–6.5 eV energy region has been employed to monitor the ZnO deposition, which revealed information about the growth mechanisms, interface phenomena and optical properties of the films. Transmission Electron Microscopy was used in order to investigate the structural characteristics of the films and to examine the film/polymer interface properties. The X‐ray Diffraction measurements revealed the changes in films structure caused by the change of the target power, nevertheless all films were preferentially grown along the (002) axis. Finally, with Atomic Force Microscopy the surface roughness of the films was defined correlated also with the target power applied. (Β© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)


πŸ“œ SIMILAR VOLUMES


Epitaxial growth of ZnO thin films on Al
✍ Rahmane, S. ;Abdallah, B. ;Soussou, A. ;Gautron, E. ;Jouan, P.-Y. ;Le Brizoual, πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 465 KB

## Abstract Hexagonal aluminium nitride (AlN) and zinc oxide (ZnO) thin films have been deposited by DC and RF reactive magnetron sputtering at room temperature. For a first set of samples, sputtered AlN films were deposited on silicon ZnO substrate. For a second set, ZnO films were deposited on Al