Growth of the high reflectivity Bi2O3 glass films by atmospheric pressure halide CVD

✍ Scribed by T Takeyama; N Takahashi; T Nakamura; S Ito

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 344 KB
• Volume: 26
• Category: Article
• ISSN: 0925-3467
• DOI: 10.1016/j.optmat.2003.12.021

✦ Synopsis

We reported the results of an investigation into the preparation of amorphous Bi 2 O 3 onto borosilicate glass substrate by means of atmospheric pressure halide chemical vapor deposition using BiI 3 and oxygen as a source materials. Obtained thin films lower than 475 °C was amorphous and it was almost transparent in infrared region. But the amorphous films are iodine-containing Bi 2 O 3 , as results of analysis by XRD and XPS.