Growth of In 0.52 Al 0.48 As epitaxial layers on InP(100) substrates by molecular beam epitaxy at a wide range of arsenic overpressure (V/III flux ratio from 30 to 300) is carried out. Analysis performed using low-temperature photoluminescence (PL) and double-axis X-ray diffraction (XRD) showed a strong and prominent dependence of the PL and XRD linewidths on the V/III flux ratio. Under our growth conditions, both the PL and XRD linewidths exhibit a minimum point at a V/III flux ratio of 150 which corresponds to a maximum in the PL intensity and XRD intensity ratio. Flux ratios exceeding 150 results in an increase in both the PL and XRD linewidths corresponding to a reduction in their associated intensities. Room-temperature Raman scattering measurements show a narrowing in the InAs-like and AlAs-like longitudinal-optic (LO) phonon linewidths which broaden at high flux ratios, while the LO phonon frequencies exhibit a gradual reduction as the flux ratio is increased. PL spectrum taken at increasing temperature show a quenching of the main emission peak followed by the evolution of a broad lower energy emission which is possibly associated with deep-lying centres. This effect is more prominent in samples grown at lower V/III flux ratios. Hall effect measurements showed a gradual reduction in the mobility in correspondence to an increase in the electron concentration as the flux ratio is increased.