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Growth of epitaxial CoSi2 on SIMOX material by a solid-phase reaction of deposited TiN/Co/Ti layers

โœ Scribed by Ping Liu; Zuyao Zhou; Chenglu Lin; Shichang Zou; Renjun Zhang; Bingzong Li; P.L.F. Hemment

Book ID
113284946
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
679 KB
Volume
96
Category
Article
ISSN
0168-583X

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๐Ÿ“œ SIMILAR VOLUMES

Epitaxial CoSi2 by solid phase reaction
Epitaxial CoSi2 by solid phase reaction of Co/Ti and Co/Hf bilayers on Si(001)
โœ M. Falke; B. Gebhardt; G. Beddies; S. Teichert; H.-J. Hinneberg ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 410 KB

TEM and RBS studies of the solid phase reaction of Co / Ti-and Co / Hf / Si(001) layer systems are reported. In addition to conventional annealing procedures a special thermal treatment was applied to investigate the intermediate stages of the reaction during heating up. With rising temperature a co