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Growth of dielectric films on semiconductors and metals using a multipole plasma

✍ Scribed by S. Gourrier; P. Friedel; P. Dimitriou; J.B. Theeten


Publisher
Elsevier Science
Year
1981
Tongue
English
Weight
573 KB
Volume
84
Category
Article
ISSN
0040-6090

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## Abstract The kinetics of growth of the open circuit insulating oxide films on Hf, Ta, Nb, Zr and Al were studies in many salt solutions using potential and capacitance measurements. The effect of salt type and concentration, oxygen concentration, temperature and surface pretreatment on the growt