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Growth of buried silicon nitride layers induced by fast thermal annealing of N2+ -implanted silicon substrates

✍ Scribed by T. Chamas; J. Pivot; J.A. Roger; C. Jardin

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 435 KB
Volume: 2
Category: Article
ISSN: 0921-5107
DOI: 10.1016/0921-5107(89)90090-1

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