Growth mechanism of polycrystalline silicon films from hydrogen-diluted SiCl[sub 4] at low temperature

✍ Scribed by Lin, Xuanying; Lin, Kuixun; Huang, Chuajun; Yu, Yunpeng; Luo, Yilin; Yu, Chuying; Huang, Rui

• Book ID: 120520633
• Publisher: American Institute of Physics
• Year: 2005
• Tongue: English
• Weight: 542 KB
• Volume: 98
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1996828