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Growth mechanism and characterisation of chemically grown Sb doped Bi2Se3 thin films

โœ Scribed by N.S. Patil; A.M. Sargar; S.R. Mane; P.N. Bhosale


Book ID
104002356
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
768 KB
Volume
254
Category
Article
ISSN
0169-4332

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โœฆ Synopsis


Bi 2ร€x Sb x Se 3 thin films were deposited on to the chemomechanically and ultrasonically cleaned glass substrate using APT. Equimolar Bi-TEA, Sb-TEA and Na 2 SeSO 3 were used as basic source materials.

UV-visible spectrophotometer (Hitachi model 330, Japan) was used to determine absorption spectra of Bi 2ร€x Sb x Se 3 in the wavelength range 350-850 nm. The layer thickness of the as deposited samples was measured by gravimetric technique using highly sensitive electronic balance; Mettler Toledo GmbHCH-8606 Greifensee having an accuracy of AE0.01 mg. The absorption coefficient, band gap and type of transition were determined from these studies. X-ray diffraction (XRD) analysis was carried out using a Philips PW-1710 X-ray diffractometer for the 2u ranging from 08 to 1008 with Cu Ka line used as a beam (l = 1.5418A8). Scanning electron microscopy (SEM) and energy dispersive X-ray analysis was performed on a JEOL-JSM-6360A scanning microscope.


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