Growth kinetics of refractory-metal thin films sputtered by r.f.-d.c. coupled magnetron sputtering in Ar or Ne gas plasma

✍ Scribed by Takeshi Tanaka; Keishi Kawabata

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 362 KB
• Volume: 46
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(95)00106-9