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Growth and Properties of TiCl4-Derived CVD Titanium Oxide Films at Different CO2/H2 Inputs

✍ Scribed by D.-H. Kuo; C.-N. Shueh

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Laser CVD of a-Si:H from SiH4 and Si2H6:

✍ K. Hesch; P. Hess; H. Oetzmann; C. Schmidt 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 651 KB